Huawei targets 1.4nm chip density by 2031 with new design law to beat US sanctions
Huawei says it expects to design chips with transistor density equivalent to 1.4nm processes by 2031 using a new scaling principle that sidesteps the need for advanced lithography tools restricted by US sanctions. Summary: Source: Huawei statement and keynote address at the 2026 IEEE International Symposium on Circuits and Systems, Shanghai Huawei unveiled the Tau Scaling Law, a new…











